Generation of Double Pulses in the Extreme Ultraviolet Spectral Range Using a Laser Combined Pinch Plasma Source

Generation of Double Pulses in the Extreme Ultraviolet Spectral Range Using a Laser Combined Pinch Plasma Source

The interaction of a dense plasma with short laser pulses (ns) is investigated. The dense plasma is created using a low-current hollow-cathode-triggered discharge. This configuration generates a dense plasma with an electron density of ne 10 17 cm 3 . Spectra are taken in the extreme ultraviolet (EUV) spectral range from11-18 nm to estimate the temperature. The interaction between plasma and la...

Laser triggered Z-pinch broadband extreme ultraviolet source for metrology

Extreme-ultraviolet high-order harmonic pulses in the microjoule range

We study high-order harmonic generation at a high pumping energy using a long focal length lens. We identify different saturation regimes of the harmonic emission, revealing the interplay between phase matching, absorption, and laser defocusing. In the optimal conditions, high conversion efficiencies are obtained, resulting in an increase of at least one order of magnitude of the harmonic energ...

Laser plasma source for extreme ultraviolet lithography using a water droplet target

Ponderomotive shearing for spectral interferometry of extreme-ultraviolet pulses.

We propose a novel method for completely characterizing ultrashort pulses at extreme-ultraviolet (XUV) wavelengths by adapting the technique of spectral phase interferometry for direct electric-field reconstruction to this spectral region. Two-electron wave packets are coherently produced by photoionizing atoms with two time-delayed replicas of the XUV pulse. For one of the XUV pulses, photoion...